Product News | Apr 02, 2014
GENxplor R&D MBE System Recognized for Breakthrough Innovation
PLAINVIEW, N.Y.–(BUSINESS WIRE)–Apr. 2, 2014– Veeco Instruments Inc. (Nasdaq:VECO) announced today that its GENxplor™ R&D Molecular Beam Epitaxy (MBE) System won the Compound Semiconductor (CS) Industry Award for the biggest breakthrough in compound semiconductor manufacturing over the last 12 months.
“The CS Industry Awards recognize companies that have won the approval of their peers,” said Richard Stevenson, Editor, Compound Semiconductor Magazine. “I believe that many readers voted for the GENxplor because they understand that university researchers are looking for a tool that is robust, relatively small, and capable of allowing them to carry out their research as quickly and successfully as possible.”
The GENxplor is a fully integrated deposition system that creates high quality epitaxial layers on substrates up to 3” in diameter and is ideal for cutting edge research on a wide variety of materials including GaAs, nitrides, and oxides. Its efficient single frame design makes it up to 40% smaller than other MBE systems, saving valuable lab space and reducing installation time. さらに、GENxplor のオープン アーキテクチャ設計により、他の MBE システムと比べ、使いやすさ、エフュージョン セルへのアクセス性、および保守性の向上が実現しました。
This is the second time in three years that Veeco has won this award. The TurboDisc® MaxBright® Multi-Reactor Metal Organic Chemical Vapor Deposition (MOCVD) System was awarded the Compound Semiconductor Manufacturing Award in 2012 for being the biggest breakthrough in compound semiconductor equipment.
“We are honored to receive the CS Manufacturing Award for the GENxplor, the first MBE system to be recognized in the compound semiconductor category,” commented Jim Northup, Vice President, General Manager for Veeco’s MBE Operations. “Since its introduction in 2013, the GENxplor has quickly become the R&D system of choice for leading research universities and institutions.”
About GENxplor R&D MBE System
Veeco’s GENxplor features an efficient single frame design that combines all vacuum hardware with on-board electronics to make it up to 40% smaller than other MBE systems, saving valuable lab space. また、この手動システムは単一フレームに統合されており、従来より短い時間での設置が可能です。The open architecture design of the GENxplor also improves ease-of-use, provides convenient access to effusion cells, and allows easier serviceability when compared to other MBE systems. 当社がすでに発表した格納式ソースと組み合わせて、酸化物材料研究に最新鋭の GENxplor システムをご活用ください。
Veecoについて
Veeco’s process equipment solutions enable the manufacture of LEDs, flexible OLEDs, power electronics, hard drives, MEMS and wireless chips. We are the market leader in LED, MBE, Ion Beam and other advanced thin film process technologies. 当社の高性能システムは、エネルギー効率、家電製品、およびネットワーク記憶装置に革新をもたらします。また、お客様の生産性の最大化と所有コストの低減を実現します。For information on our company, products and worldwide service and support, please visit www.veeco.com .
To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risks discussed in the Business Description and Management’s Discussion and Analysis sections of Veeco’s Annual Report on Form 10-K for the year ended December 31, 2013 and in our subsequent quarterly reports on Form 10-Q, current reports on Form 8-K and press releases. Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.
Source: Veeco Instruments Inc.
Veeco Instruments Inc.
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Debra Wasser, 516-677-0200 x1473
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Veecoは、HDD製造を新たな生産レベルに引き上げる業界リーダーです。